'Oxygen tunnel' structure could solve 3D memory reliability problem to boost AI chip performance
This story is from 2026-08-19. It is preserved in the archive; the latest stories are on the live feed.
As AI systems become more advanced, memory is required to transfer larger amounts of data at higher speeds. But conventional planar semiconductor scaling is running out of room. A KAIST research team has now addressed a key weakness in three-dimensional, vertically stacked memory devices, opening a…
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- 2026-08-19 15:20 · TechXplore AI & ML
'Oxygen tunnel' structure could solve 3D memory reliability problem to boost AI chip performance